• DocumentCode
    2090348
  • Title

    A novel void detection technique for via filling process

  • Author

    Umemura, Eiichi ; Fukunaga, Hiroyuki ; Koga, Yoshihiro ; Nakayashiki, Hiroyuki

  • Author_Institution
    Oki Electr. Ind. Co., Ltd., Tokyo, Japan
  • fYear
    2005
  • fDate
    13-15 Sept. 2005
  • Firstpage
    225
  • Lastpage
    228
  • Abstract
    We have developed a new technique for detecting small voids formed at via holes that are rarely detected in the conventional test process. In the developed technique, high current force is used to correctly detect voids within 1 sec. This technique is based on the negative voltage shift caused by void disappearance under a high constant current force. Since void detection is successfully achieved by a quick test without cross-sectional observation, the technique has significant positive impact on screening and process monitoring of production lines. This helps to prevent the shipping of flawed products that would cause problems in the marketplace.
  • Keywords
    integrated circuit interconnections; integrated circuit manufacture; integrated circuit testing; process monitoring; production management; voids (solid); 1 sec; flawed products; high current force; negative voltage shift; process monitoring; production lines; screening process; via hole filling; void detection technique; void disappearance; Copper; Electrical resistance measurement; Filling; Gas detectors; Monitoring; Optical microscopy; Production; Scanning electron microscopy; Testing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
  • Print_ISBN
    0-7803-9143-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2005.1513342
  • Filename
    1513342