DocumentCode
2090348
Title
A novel void detection technique for via filling process
Author
Umemura, Eiichi ; Fukunaga, Hiroyuki ; Koga, Yoshihiro ; Nakayashiki, Hiroyuki
Author_Institution
Oki Electr. Ind. Co., Ltd., Tokyo, Japan
fYear
2005
fDate
13-15 Sept. 2005
Firstpage
225
Lastpage
228
Abstract
We have developed a new technique for detecting small voids formed at via holes that are rarely detected in the conventional test process. In the developed technique, high current force is used to correctly detect voids within 1 sec. This technique is based on the negative voltage shift caused by void disappearance under a high constant current force. Since void detection is successfully achieved by a quick test without cross-sectional observation, the technique has significant positive impact on screening and process monitoring of production lines. This helps to prevent the shipping of flawed products that would cause problems in the marketplace.
Keywords
integrated circuit interconnections; integrated circuit manufacture; integrated circuit testing; process monitoring; production management; voids (solid); 1 sec; flawed products; high current force; negative voltage shift; process monitoring; production lines; screening process; via hole filling; void detection technique; void disappearance; Copper; Electrical resistance measurement; Filling; Gas detectors; Monitoring; Optical microscopy; Production; Scanning electron microscopy; Testing; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
Print_ISBN
0-7803-9143-8
Type
conf
DOI
10.1109/ISSM.2005.1513342
Filename
1513342
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