Advanced process control for implant toolset for logic and flash technologies

In recent technologies (both flash and logic) device performances are key parameters to ensure high product performances. For logic technologies transistor electrical length is closely correlated with product speed performance and, for flash technologies, the current of the high performance transistors are closely correlated with the array access time. This paper is related to an advanced process control that has been put in place on the implant toolset to properly control and optimize the electrical performance of these transistors. Specific Implant tool parameters, collected in real time from chamber tool sensors, have been correlated with electrical yield and product performance. The analysis has been carried on flash and logic devices.