• DocumentCode
    2091996
  • Title

    Novel photo resist stripping for single wafer environmentally friendly process

  • Author

    Okuyama, Atsushi ; Asada, Kazumi ; Ishizaki, Itsuro ; Iwamoto, Hayato ; Hashizume, Akio

  • Author_Institution
    Sony Corp., Atsugi, Japan
  • fYear
    2005
  • fDate
    13-15 Sept. 2005
  • Firstpage
    453
  • Lastpage
    455
  • Abstract
    We have developed the resist stripping method having an extremely high stripping performance by single wafer process (SHARK Cleaning). In this study, we tried the improvement of the running cost that was the disadvantage of the SHARK cleaning. As a result, we drastically improved the chemical consumption maintaining the resist stripping performance by heating H2SO4 and optimizing the mixture ratio of the chemicals. Therefore, a cost reduction and environmentally friendly process with a high stripping performance were possible.
  • Keywords
    cleaning; cost reduction; environmental management; integrated circuit manufacture; photoresists; SHARK cleaning; cost reduction; mixture ratio; photo resist stripping; resist stripping method; single wafer environmentally friendly process; Chemicals; Costs; Green cleaning; Implants; Pollution measurement; Resists; Scanning probe microscopy; Strips; Temperature; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2005. ISSM 2005, IEEE International Symposium on
  • Print_ISBN
    0-7803-9143-8
  • Type

    conf

  • DOI
    10.1109/ISSM.2005.1513403
  • Filename
    1513403
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2091996