Fringe-field-activated SOI tilting mirrors

Author

Greywall, Dennis S. ; Pai, Chien-Shing ; Oh, Sang-Hyun ; Chang, Chorng-Ping ; Marom, Dan M. ; Stanton, Stuart ; Busch, Paul A. ; Cirelli, Raymond A. ; Taylor, J. Ashley ; Klemens, Fred P. ; Sorsch, Thomas W. ; Bower, J. Eric ; Lai, Warren Y C ; Soh, Hyong

Author_Institution

Lucent Technol. Bell Labs, Murray Hill, NJ, USA

fYear

2003

fDate

18-21 Aug. 2003

Firstpage

91

Lastpage

92

Abstract

This paper discusses a significant improvement of the SOI process that can be implemented in various manners and that remedies many problems of earlier fabrication schemes. In particular the new MOEMS structures are monolithic, do not exhibit rotational snapdown, have electrical shielding between channels, and have activation voltages less than or comparable to parallel plate devices. The approach is discussed in terms of an application requiring a linear array of closely-spaced cantilever mirrors.

Keywords

micromechanical devices; micromirrors; optical arrays; optical fabrication; silicon-on-insulator; MOEMS; SOI tilting mirrors; Si; cantilever mirrors; fringe-field-activated mirrors; linear array; monolithic structures; Dielectric substrates; Electrodes; Electrostatics; Etching; Micromechanical devices; Mirrors; Research and development; Silicon; Springs; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS, 2003 IEEE/LEOS International Conference on

Print_ISBN

0-7803-7830-X

Type

conf

DOI

10.1109/OMEMS.2003.1233482

Filename

1233482