Photonic crystal switch by inserting nano-crystal defects using MEMS actuator

Author

Kanamori, Y. ; Inoue, K. ; Horie, K. ; Hane, K.

Author_Institution

Dept. of Mechatronics & Precision Eng., Tohoku Univ., Sendai, Japan

fYear

2003

fDate

18-21 Aug. 2003

Firstpage

107

Lastpage

108

Abstract

A novel photonic crystal switch by inserting crystal defects using a MEMS actuator was proposed. Optical parameters for obtaining photonic crystal switch were determined. The number of air holes necessary for light switching, and allowable gaps between the air hole and silicon rod, were decided by a FDTD simulation. The fabrication techniques using electron beam lithography, fast atom beam etching and HF gas-phase etching were proposed.

Keywords

crystal defects; electron beam lithography; electrostatic actuators; etching; finite difference time-domain analysis; micro-optics; microswitches; nanostructured materials; optical fabrication; optical switches; photonic crystals; FDTD simulation; HF gas-phase etching; MEMS actuator; air holes; electron beam lithography; fabrication techniques; fast atom beam etching; light switching; nanocrystal defects; photonic crystal switch; silicon rod; Actuators; Atom optics; Electron optics; Etching; Finite difference methods; Micromechanical devices; Optical switches; Photonic crystals; Silicon; Time domain analysis;

fLanguage

English

Publisher

ieee

Conference_Titel

Optical MEMS, 2003 IEEE/LEOS International Conference on

Print_ISBN

0-7803-7830-X

Type

conf

DOI

10.1109/OMEMS.2003.1233489

Filename

1233489