Title :
A high fill factor 1 × N spatial light modulator based on an epitaxial polysilicon process
Author :
Dokmeci, M.R. ; Pareek, A. ; Kirkos, G. ; Bernstein, J.
Author_Institution :
Corning Intellisense, Wilmington, MA, USA
Abstract :
This study introduces novel spatial light modulator (SLM) designs with flat micromirrors which require no etch release holes. A combination of surface micromachining and epitaxial polysilicon process is used in device fabrication. This process minimizes insertion loss since it is based on the requirements of MEMS based optical systems.
Keywords :
elemental semiconductors; micromachining; micromechanical devices; micromirrors; optical design techniques; optical fabrication; optical losses; semiconductor epitaxial layers; silicon; spatial light modulators; MEMS based optical systems; SLM designs; device fabrication; epitaxial polysilicon process; fill factor; flat micromirrors; insertion loss; spatial light modulator; surface micromachining; Attenuation; Etching; Insertion loss; Micromachining; Micromechanical devices; Mirrors; Optical attenuators; Optical interferometry; Optical modulation; Optical sensors;
Conference_Titel :
Optical MEMS, 2003 IEEE/LEOS International Conference on
Print_ISBN :
0-7803-7830-X
DOI :
10.1109/OMEMS.2003.1233498
