DocumentCode
2096177
Title
Fabrication and characterization of silicon photonic waveguides and devices via selective oxidation process
Author
Xiaokun Wang ; Xiaowei Guan ; Yaocheng Shi ; Daoxin Dai
Author_Institution
State Key Lab. for Modern Opt. Instrum., Zhejiang Univ., Hangzhou, China
fYear
2012
fDate
7-10 Nov. 2012
Firstpage
1
Lastpage
3
Abstract
Silicon-on-insulator (SOI) optical waveguides are fabricated via selective oxidation process without any silicon etching step so that the waveguide surface becomes very smooth to achieve low-loss light propagation potentially. A high-Q ring-resonator is also demonstrated.
Keywords
Q-factor; elemental semiconductors; integrated optics; optical fabrication; optical resonators; optical waveguides; oxidation; silicon; silicon-on-insulator; SOI; Si; high-Q ring-resonator; low-loss light propagation; selective oxidation process; silicon photonic waveguides; silicon-on-insulator;
fLanguage
English
Publisher
ieee
Conference_Titel
Communications and Photonics Conference (ACP), 2012 Asia
Conference_Location
Guangzhou
ISSN
2162-108X
Print_ISBN
978-1-4673-6274-0
Type
conf
Filename
6510892
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