DocumentCode
2097286
Title
Silicon nanophotonic wire structures fabricated by 193nm optical lithography
Author
Selvaraja, Shankar Kumar ; Jaenen, Patrick ; Beckx, Stephan ; Bogaert, Wim ; Dumon, Pieter ; Van Thourout, Dries ; Bates, Roel
Author_Institution
Univ. of Gent-IMEC, Ghent
fYear
2007
fDate
21-25 Oct. 2007
Firstpage
48
Lastpage
49
Abstract
We demonstrate the use of 193 nm optical lithography for fabricating nanophotonic wire structures on silicon-on-insulator (SOI) technology. We present fabrication and measurement result on wire devices. We report a propagation loss of 2.8 dB/cm for 450times220 nm photonic wire.
Keywords
elemental semiconductors; integrated optics; integrated optoelectronics; nanowires; photolithography; photonic crystals; silicon; Si; nanophotonic wire structures; optical lithography; propagation loss; silicon-on-insulator technology; wavelength 193 nm; Circuits; Coatings; Etching; Lithography; Nanostructures; Optical device fabrication; Photonics; Resists; Silicon; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location
Lake Buena Vista, FL
ISSN
1092-8081
Print_ISBN
978-1-4244-0925-9
Electronic_ISBN
1092-8081
Type
conf
DOI
10.1109/LEOS.2007.4382268
Filename
4382268
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