Title :
Silicon nanophotonic wire structures fabricated by 193nm optical lithography
Author :
Selvaraja, Shankar Kumar ; Jaenen, Patrick ; Beckx, Stephan ; Bogaert, Wim ; Dumon, Pieter ; Van Thourout, Dries ; Bates, Roel
Author_Institution :
Univ. of Gent-IMEC, Ghent
Abstract :
We demonstrate the use of 193 nm optical lithography for fabricating nanophotonic wire structures on silicon-on-insulator (SOI) technology. We present fabrication and measurement result on wire devices. We report a propagation loss of 2.8 dB/cm for 450times220 nm photonic wire.
Keywords :
elemental semiconductors; integrated optics; integrated optoelectronics; nanowires; photolithography; photonic crystals; silicon; Si; nanophotonic wire structures; optical lithography; propagation loss; silicon-on-insulator technology; wavelength 193 nm; Circuits; Coatings; Etching; Lithography; Nanostructures; Optical device fabrication; Photonics; Resists; Silicon; Wire;
Conference_Titel :
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
978-1-4244-0925-9
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2007.4382268
