DocumentCode :
2098318
Title :
Design and optimization of a low-power and very-high-performance 0.25-μm advanced PNP bipolar process
Author :
Djezzar, Boualem
Author_Institution :
Centre de Dev. des Technol. Avancees, Algiers, Algeria
Volume :
1
fYear :
1996
fDate :
9-12 Oct 1996
Firstpage :
75
Abstract :
Low-power and very-high-performance 0.25-μm vertical PNP bipolar process is designed and characterized by using the mixed two-dimensional numerical device/circuit simulator (CODECS). This PNP transistor has a 25-nm-wide emitter, a 38-nm-wide base region, a current gain of 17 (without poly-Si emitter effect), and maximum cut-off frequency of 24-GHz. The conventional ECL circuits, designed by this PNP transistor, exhibit an unloaded gate delay of 22-ps at 1.75-mW, and a delay time less than 16-ps/stage for unloaded ECL ring-oscillator
Keywords :
bipolar logic circuits; circuit analysis computing; delays; digital simulation; emitter-coupled logic; logic CAD; very high speed integrated circuits; 0.25 micron; 1.75 mW; 22 ps; 24 GHz; 25 nm; 38 nm; CODECS; ECL circuits; advanced PNP bipolar process; base region; current gain; maximum cut-off frequency; mixed two-dimensional numerical device/circuit simulator; ring-oscillator; unloaded gate delay; CMOS technology; Charge carrier processes; Circuits; Delay effects; Design optimization; Doping; Electron mobility; Laboratories; Microelectronics; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference, 1996., International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-3223-7
Type :
conf
DOI :
10.1109/SMICND.1996.557309
Filename :
557309
Link To Document :
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