• DocumentCode
    2098372
  • Title

    Waveguide grating coupler based on CMOS poly-silicon gate layer

  • Author

    Chao Qiu ; Zhen Sheng ; Le Li ; Pang, Ai-Chun ; Aimin Wu ; Xi Wang ; Shichang Zou ; Fuwan Gan

  • Author_Institution
    State Key Lab. of Functional Mater. for Inf., Shanghai Inst. of Microsyst. & Inf. Technol., Shanghai, China
  • fYear
    2012
  • fDate
    7-10 Nov. 2012
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    Grating couplers based on CMOS poly-silicon gate layer are experimentally demonstrated with coupling efficiency of ~40%. By adding full-etched trenches in the waveguide layer, the coupling efficiency can be further improved to ~70%.
  • Keywords
    CMOS integrated circuits; diffraction gratings; elemental semiconductors; integrated optoelectronics; optical couplers; silicon; CMOS polysilicon gate layer; Si; coupling efficiency; full-etched trenches; waveguide grating coupler; waveguide layer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Communications and Photonics Conference (ACP), 2012 Asia
  • Conference_Location
    Guangzhou
  • ISSN
    2162-108X
  • Print_ISBN
    978-1-4673-6274-0
  • Type

    conf

  • Filename
    6510981
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2098372