• DocumentCode
    2100559
  • Title

    Sub-100 nm soft lithography for optoelectronics applications

  • Author

    Meneou, K. ; Cheng, K.Y.

  • Author_Institution
    Univ. of Illinois at Urbana-Champaign, Urbana
  • fYear
    2007
  • fDate
    21-25 Oct. 2007
  • Firstpage
    331
  • Lastpage
    332
  • Abstract
    Soft lithography followed by etching is used to pattern compound semiconductor pieces with dense arrays of sub-100 nm features. A variety of possible applications in nanophotonics and optoelectronic devices are discussed.
  • Keywords
    etching; integrated optoelectronics; nanoelectronics; soft lithography; compound semiconductor pieces; etching; nanophotonics; optoelectronic devices; soft lithography; Biomedical optical imaging; Gallium arsenide; III-V semiconductor materials; Optical materials; Optical polymers; Optical sensors; Resists; Soft lithography; Substrates; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    1092-8081
  • Print_ISBN
    978-1-4244-0925-9
  • Electronic_ISBN
    1092-8081
  • Type

    conf

  • DOI
    10.1109/LEOS.2007.4382412
  • Filename
    4382412
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2100559