Title :
Sub-100 nm soft lithography for optoelectronics applications
Author :
Meneou, K. ; Cheng, K.Y.
Author_Institution :
Univ. of Illinois at Urbana-Champaign, Urbana
Abstract :
Soft lithography followed by etching is used to pattern compound semiconductor pieces with dense arrays of sub-100 nm features. A variety of possible applications in nanophotonics and optoelectronic devices are discussed.
Keywords :
etching; integrated optoelectronics; nanoelectronics; soft lithography; compound semiconductor pieces; etching; nanophotonics; optoelectronic devices; soft lithography; Biomedical optical imaging; Gallium arsenide; III-V semiconductor materials; Optical materials; Optical polymers; Optical sensors; Resists; Soft lithography; Substrates; Wet etching;
Conference_Titel :
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
978-1-4244-0925-9
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2007.4382412
