• DocumentCode
    2102476
  • Title

    EUV sources for Lithography

  • Author

    Richardson, Martin

  • Author_Institution
    Univ. of Central Florida, Orlando
  • fYear
    2007
  • fDate
    21-25 Oct. 2007
  • Firstpage
    482
  • Lastpage
    483
  • Abstract
    Pressed by the demands of the impending implementation of Extreme UV Lithography at the end of the decade, several competing EUV light source technologies vie to capture a billion dollar market. Here we review this exciting competition.
  • Keywords
    ultraviolet lithography; ultraviolet sources; UV sources; extreme UV lithography; Fiber lasers; Laser theory; Lithography; Mirrors; Optical pulses; Plasma sources; Power lasers; Pump lasers; Solid lasers; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
  • Conference_Location
    Lake Buena Vista, FL
  • ISSN
    1092-8081
  • Print_ISBN
    978-1-4244-0925-9
  • Electronic_ISBN
    1092-8081
  • Type

    conf

  • DOI
    10.1109/LEOS.2007.4382489
  • Filename
    4382489
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2102476