DocumentCode
2102525
Title
Stabilized droplet target delivery for high power EUV generation for lithography
Author
Cunado, Jose ; Takenoshita, Kazutoshi ; George, Simi A. ; Schmid, Tobias ; Bernath, Robert ; Brown, Christopher ; Duncan, Joshua ; Richardson, Martin C.
Author_Institution
Univ. of Central Florida, Orlando
fYear
2007
fDate
21-25 Oct. 2007
Firstpage
484
Lastpage
485
Abstract
A stabilized targeting scheme is installed in the EUV light source facility and performs high level of stability of tin-doped droplet target positioning for a long term, which is required for the EUVL sources.
Keywords
drops; light sources; solid lasers; ultraviolet lithography; EUV generation; extreme ultraviolet emission; light source; lithography; stabilized droplet target delivery; Light sources; Lighting; Lithography; Nonhomogeneous media; Optical pulses; Optical sensors; Power generation; Pump lasers; Target tracking; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location
Lake Buena Vista, FL
ISSN
1092-8081
Print_ISBN
978-1-4244-0925-9
Electronic_ISBN
1092-8081
Type
conf
DOI
10.1109/LEOS.2007.4382490
Filename
4382490
Link To Document