DocumentCode
2102551
Title
Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
Author
Wachulak, P.W. ; Capeluto, M.G. ; Patel, D. ; Marconi, M.C. ; Menoni, C.S. ; Rocca, J.J.
Author_Institution
Colorado State Univ., Fort Collins
fYear
2007
fDate
21-25 Oct. 2007
Firstpage
486
Lastpage
487
Abstract
Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top lambda = 46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose.
Keywords
laser materials processing; nanolithography; nanostructured materials; ultraviolet lithography; exposure dose; multiple exposure interferometric lithography; nanoholes; nanopillars; ultraviolet interferometric laser lithography; wavelength 46.9 nm; Interference; Interferometric lithography; Laser beams; Laser theory; Mirrors; Nanopatterning; Optical arrays; Resists; Size control; Ultraviolet sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location
Lake Buena Vista, FL
ISSN
1092-8081
Print_ISBN
978-1-4244-0925-9
Electronic_ISBN
1092-8081
Type
conf
DOI
10.1109/LEOS.2007.4382491
Filename
4382491
Link To Document