Title :
Nanopillars and arrays of nanoholes fabricated by extreme ultraviolet interferometric laser lithography
Author :
Wachulak, P.W. ; Capeluto, M.G. ; Patel, D. ; Marconi, M.C. ; Menoni, C.S. ; Rocca, J.J.
Author_Institution :
Colorado State Univ., Fort Collins
Abstract :
Arrays of holes and pillars were fabricated by multiple exposure interferometric lithography using a table top lambda = 46.9 nm wavelength laser. Size and the feature characteristic is controlled changing the applied exposure dose.
Keywords :
laser materials processing; nanolithography; nanostructured materials; ultraviolet lithography; exposure dose; multiple exposure interferometric lithography; nanoholes; nanopillars; ultraviolet interferometric laser lithography; wavelength 46.9 nm; Interference; Interferometric lithography; Laser beams; Laser theory; Mirrors; Nanopatterning; Optical arrays; Resists; Size control; Ultraviolet sources;
Conference_Titel :
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
978-1-4244-0925-9
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2007.4382491
