DocumentCode :
21030
Title :
Modeling the Impact of Reset Depth on Vacancy-Induced Filament Perturbations in {\\rm HfO}_{2} RRAM
Author :
Raghavan, N. ; Degraeve, Robin ; Fantini, Andrea ; Goux, L. ; Wouters, D.J. ; Groeseneken, Guido ; Jurczak, Malgorzata
Author_Institution :
Emerging Memories Group, Imec, Heverlee, Belgium
Volume :
34
Issue :
5
fYear :
2013
fDate :
May-13
Firstpage :
614
Lastpage :
616
Abstract :
Random telegraph noise in resistive switching memory devices is governed by two distinct mechanisms-oxygen vacancy perturbations in the filament as well as the electron trapping-detrapping phenomenon. In this letter, we focus on the dominant role of vacancies in governing the stability of the filament in the high resistance state and characterize the dependence of the read disturb voltage (VDIST) on the depth of the reset level during switching. Our slow voltage ramp read disturb tests at different reset levels indicate the possibility of filamentary instability even for read voltages lower than the standard value of 0.10 V. These experimental trends can be well explained using the quantum point contact model for conduction in the filament, as deeper reset levels induce very steep potential gradients at the two ends of the constriction that make the filaments highly unstable and susceptible to structural modifications due to vacancy generation and/or transport during memory read operation.
Keywords :
hafnium compounds; high-k dielectric thin films; integrated circuit modelling; integrated circuit noise; quantum point contacts; random noise; random-access storage; vacancies (crystal); HfO2; RRAM; electron trapping-detrapping phenomenon; oxygen vacancy perturbations; quantum point contact model; random telegraph noise; read disturb voltage; reset depth impact modelling; resistive switching memory devices; steep potential gradients; vacancy-induced filament perturbations; voltage ramp read disturb tests; High resistance state (HRS); hourglass (HG) model; oxygen vacancy; quantum point contact (QPC); random telegraph noise (RTN); resistive random access memory (RRAM);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2254462
Filename :
6502198
Link To Document :
بازگشت