Title :
Tunneling and depletion-mode TFTs fabricated by low-temperature stress-assisted Cu-induced lateral growth and metal-free crystallization of germanium
Author :
Hekmatshoar, B. ; Mohajerzadeh, S. ; Shahrjerdi, D. ; Robertson, M.D.
Author_Institution :
ECE Dept., Tehran Univ., Iran
Abstract :
Tunneling and depletion-mode poly-Ge TFTs were fabricated at temperatures as low as 150°C and 200°C respectively. Fabrication of the tunneling TFTs was based on stress-assisted lateral growth of Ge from Cu-seeded islands. In a different approach, depletion-mode TFTs were fabricated, based on metal-free crystallization of Ge by successive steps of hydrogenation and annealing.
Keywords :
copper; crystallisation; elemental semiconductors; germanium; hydrogenation; island structure; recrystallisation annealing; thin film transistors; tunnelling; 150 degC; 200 degC; Cu-seeded islands; Ge; Ge-Cu; annealing; depletion-mode TFT; hydrogenation; low-temperature stress-assisted copper-induced lateral growth; metal-free crystallization; tunneling TFT; Annealing; Compressive stress; Crystallization; Diffraction; Germanium; Hydrogen; Plasma temperature; Positron emission tomography; Substrates; Tunneling;
Conference_Titel :
Device Research Conference, 2004. 62nd DRC. Conference Digest [Includes 'Late News Papers' volume]
Print_ISBN :
0-7803-8284-6
DOI :
10.1109/DRC.2004.1367796