• DocumentCode
    2103758
  • Title

    An extended model for carbon nanotube field-effect transistors

  • Author

    Knoch, J. ; Mantl, S. ; Lin, Y.-M. ; Chen, Z. ; Avouris, Ph. ; Appenzeller, J.

  • Author_Institution
    Inst. for Thin Films & Interfaces, Forschungszentrum Julich GmbH, Germany
  • fYear
    2004
  • fDate
    21-23 June 2004
  • Firstpage
    135
  • Abstract
    In this paper, we present an extended Schottky barrier model that includes two new crucial aspects: i) current injection from the metal contacts into the channel does not occur directly but is mediated by the segment of the nanotube underneath the metal contacts whose density of states (DOS) is altered through the proximity of the metal (referred to in the following as "metal-modified" nanotube segment); and ii) the energy gap of carbon nanotubes with an average diameter of ∼1.4 nm seems to be rather ∼1.2 eV than ∼0.7 eV as typically assumed for these type of tubes. Our simulation allows us for the first time to quantitatively describe subthreshold characteristics of CNFETs over the entire gate voltage range.
  • Keywords
    Schottky barriers; carbon nanotubes; electronic density of states; energy gap; field effect transistors; nanotube devices; semiconductor device models; 0.7 eV; 1.2 eV; 1.4 nm; C; CNFET model; CNFET subthreshold characteristics; Schottky barrier model; carbon nanotube energy gap; carbon nanotube field-effect transistors; channel metal contact current injection; density of states; metal-modified nanotube segment; CNTFETs; Carbon nanotubes; Dispersion; Gold; Information technology; MOSFETs; Photonic band gap; Schottky barriers; Thin film transistors; Titanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference, 2004. 62nd DRC. Conference Digest [Includes 'Late News Papers' volume]
  • ISSN
    1548-3770
  • Print_ISBN
    0-7803-8284-6
  • Type

    conf

  • DOI
    10.1109/DRC.2004.1367821
  • Filename
    1367821