Title :
Impact of transistor aging on RF low noise amplifier performance of 28nm technology: Reliability assessment
Author :
Mahato, S. ; Gielen, G.
Author_Institution :
Dept. of Electr. Eng., Katholieke Univ. Leuven, Leuven, Belgium
Abstract :
Transistor reliability has become one of the major concerns in reliable circuit design in advanced CMOS nanometer technology. Transistor aging can have a significant impact on the performance of the RF frontend circuits. In this paper, the impacts of transistor aging on a RF low noise amplifier (LNA) are studied. In this work, single-ended cascode LNA with source inductive degeneration and LC folded-cascode LNA test circuits are used to study the transistor aging effect. The noise figure (NF) and the gain, critical performance parameters of a LNA are shown to be degradation-sensitive. It is shown that the noise figure of the LNA is significantly increased and the gain of the LNA is decreased by the aging effect using a 28nm technology. The optimum gate bias point and the cascode structure have been shown as design guidelines to make the LNA more reliable.
Keywords :
ageing; circuit noise; circuit reliability; circuit testing; inductors; low noise amplifiers; network synthesis; radiofrequency amplifiers; transistors; CMOS nanometer technology; LC folded-cascode LNA test circuit; RF frontend circuit; RF low noise amplifier; cascode structure; circuit design; optimum gate bias point; reliability assessment; single-ended cascode LNA; size 28 nm; source inductive degeneration; transistor aging effect; Aging; Degradation; Gain; Noise measurement; Reliability; Topology; Transistors;
Conference_Titel :
Electronics, Circuits, and Systems (ICECS), 2013 IEEE 20th International Conference on
Conference_Location :
Abu Dhabi
DOI :
10.1109/ICECS.2013.6815442