Title :
Optically FlatMicromirror Designs Using Stretched Membrane with Crystallization-Induced Stress
Author :
Sasaki, Minoru ; Sasaki, Takashi ; Hane, Kazuhiro ; Miura, Hideo
Author_Institution :
Toyota Technol. Inst., Nagoya
Abstract :
The flat and light-weighted micromirror is realized using the tense poly-Si membrane across a rigid c-Si drum. The tensile stress of ~600 MPa is obtained using the crystallization of a-Si. The yield ratio depends on the design. The membrane profile is found to depend on the process sequence relating to the timing of the crystallization. The mirror satisfies the optical flatness <lambda/10 for the visible light. The peak-to-valley distance of ~20 mn is realized in the best design. The mirror flatness is stable against the temperature even though the mirror is metalized.
Keywords :
crystallisation; membranes; micromirrors; silicon; stress effects; Si; crystallization-induced stress; light-weighted micromirror; optical flatness; optically flat micromirror; peak-to-valley distance; poly-Si membrane; rigid c-Si drum; stretched membrane; tensile stress; Biomembranes; Crystallization; Etching; Micromirrors; Mirrors; Optical design; Optical films; Temperature; Tensile stress; Thermal stresses; amorphous; crystallization; micromirror; optical flatness; tensile stress;
Conference_Titel :
Lasers and Electro-Optics Society, 2007. LEOS 2007. The 20th Annual Meeting of the IEEE
Conference_Location :
Lake Buena Vista, FL
Print_ISBN :
978-1-4244-0925-9
Electronic_ISBN :
1092-8081
DOI :
10.1109/LEOS.2007.4382604
