DocumentCode :
2105346
Title :
Low-voltage, high-performance InAs/AlSb HEMTs with power gain above 100 GHz at 100 mV drain bias
Author :
Bergman, Joanne ; Nagy, G. ; Sullivan, Gary ; Ikhlassi, Amal ; Brar, B.
Author_Institution :
Rockwell Sci. Center, Thousand Oaks, USA
fYear :
2004
fDate :
21-23 June 2004
Firstpage :
243
Abstract :
Ultra-low power circuits require transistors with usable RF gain at low bias voltages and currents. In the present paper, we report 100 nm gate-length InAs/AlSb HEMTs with fτ and fmax both exceeding 100 GHz at a mere 100 mV of drain bias. The devices also show excellent peak value for fτ of 235 GHz and, to the best of our knowledge, a record fmax of 235 GHz at a higher drain bias of 300 mV.
Keywords :
III-V semiconductors; aluminium compounds; high electron mobility transistors; indium compounds; low-power electronics; millimetre wave field effect transistors; 100 GHz; 100 mV; 100 nm; 235 GHz; 300 mV; InAs-AlSb; drain bias; high-performance HEMT; low-voltage HEMT; ultra-low power circuits; Art; Circuits; Electrons; Gallium arsenide; HEMTs; Indium compounds; Low voltage; MODFETs; Photonic band gap; Radio frequency;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2004. 62nd DRC. Conference Digest [Includes 'Late News Papers' volume]
ISSN :
1548-3770
Print_ISBN :
0-7803-8284-6
Type :
conf
DOI :
10.1109/DRC.2004.1367888
Filename :
1367888
Link To Document :
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