Topolithography and its application to the manufacture of 3D diode-based memories

Topolithography is a process wherein all of the information necessary to define a circuit is applied to a substrate in a single step. A multilevel surface topology defines the circuit for subsequent self-assembly so no photolithographic steps are required to manufacture a circuit resulting in substantially reduced costs. A transistor-less memory circuit is designed where high density storage, address decoding and I/O are implemented using an array of diodes.