• DocumentCode
    2107887
  • Title

    Equipment Simulation - State Of The Art And Future Challenges

  • Author

    Werner, Chr.

  • Author_Institution
    SIEMENS
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    6
  • Lastpage
    9
  • Keywords
    Chemical reactors; Chemical technology; Differential equations; Hydrodynamics; Inductors; Manufacturing processes; Plasma temperature; Semiconductor device manufacture; Virtual manufacturing; Viscosity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724701
  • Filename
    724701
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=2107887