DocumentCode :
2110282
Title :
GaN as a displacement technology for silicon in power management
Author :
Lidow, Alex
Author_Institution :
Efficient Power Conversion Corp., El Segundo, CA, USA
fYear :
2011
fDate :
17-22 Sept. 2011
Firstpage :
1
Lastpage :
6
Abstract :
For the past three decades, power management efficiency and cost have shown steady improvement as innovations in power MOSFET structures, technology, and circuit topologies have paced the growing need for electrical power in our daily lives. In the last few years, however, the rate of improvement has slowed as the silicon power MOSFET has asymptotically approached its theoretical bounds. We address the new game-changing power management products, available today and planned for the near future, that are built on Gallium Nitride grown on top of a silicon substrate. Enhancement mode devices (eGaN® FETs) are demonstrated in DC-DC conversion applications. Roadmaps for improved device performance and for system-on-chip integration will also be discussed. Performance is only one dimension of the equation leading to the conclusion that eGaN technology is a game changer. The other dimensions are product reliability, ease of use, and cost. These topics will also be discussed showing that the capability to displace silicon across a significant portion of the power management market is now in hand.
Keywords :
elemental semiconductors; gallium compounds; power MOSFET; silicon; substrates; system-on-chip; wide band gap semiconductors; GaN; Si; displacement technology; enhancement mode devices; power MOSFET structures; power management; silicon substrate; system-on-chip integration; Epitaxial growth; FETs; Gallium nitride; Power MOSFET; Reliability; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Energy Conversion Congress and Exposition (ECCE), 2011 IEEE
Conference_Location :
Phoenix, AZ
Print_ISBN :
978-1-4577-0542-7
Type :
conf
DOI :
10.1109/ECCE.2011.6063741
Filename :
6063741
Link To Document :
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