DocumentCode

2111470

Title

Feature-scale Modeling And Characterization Of Oxide APCVD

Author

Thye-Lai Tung

Author_Institution

Intel Corporation

fYear

1993

fDate

14-15 May 1993

Firstpage

70

Lastpage

71

Keywords

Atmospheric modeling; Chemical vapor deposition; Electrodes; Equations; Fluid flow; Process control; Scattering; Surface treatment;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on

Print_ISBN

0-7803-1338-0

Type

conf

DOI

10.1109/VPAD.1993.724727

Filename

724727