Title :
Modelling Of Surface Reactions For Predicting Dry-etched Profiles
Author :
Harafuji, K. ; Misaka, A. ; Kubota, M. ; Nomura, N.
Author_Institution :
Matsushita Electric Ind. Co., Ltd.
Keywords :
Amplitude shift keying; Chemicals; Dry etching; Flowcharts; Predictive models; Sputter etching; Sputtering; Substrates; Surface cleaning; Topology;
Conference_Titel :
VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
Print_ISBN :
0-7803-1338-0
DOI :
10.1109/VPAD.1993.724729
