DocumentCode

2112029

Title

Modelling Of Surface Reactions For Predicting Dry-etched Profiles

Author

Harafuji, K. ; Misaka, A. ; Kubota, M. ; Nomura, N.

Author_Institution

Matsushita Electric Ind. Co., Ltd.

fYear

1993

fDate

14-15 May 1993

Firstpage

76

Lastpage

79

Keywords

Amplitude shift keying; Chemicals; Dry etching; Flowcharts; Predictive models; Sputter etching; Sputtering; Substrates; Surface cleaning; Topology;

fLanguage

English

Publisher

ieee

Conference_Titel

VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on

Print_ISBN

0-7803-1338-0

Type

conf

DOI

10.1109/VPAD.1993.724729

Filename

724729