Title :
Ultrashort and Low-Loss Polarization Rotators Utilizing Hybrid Plasmonic-Dielectric Couplers
Author :
Mei Yin ; Qingzhong Deng ; Yanping Li ; Xingjun Wang ; Hongbin Li
Author_Institution :
State Key Lab. of Adv. Opt. Commun. Syst. & Networks, Peking Univ., Beijing, China
Abstract :
In this letter, we propose a hybrid plasmonic polarization rotator (PR) utilizing asymmetrical directional coupling between a hybrid plasmonic waveguide and a strip Si dielectric waveguide (DW), which features ultracompact size, low insertion loss (IL), and silicon-on-insulator compatibility. The coupling length is only 11.2 μm, much shorter than the PRs based on asymmetrical directional coupling between two strip DWs on the same silicon core layer with the same coupling gap. The presented PR shows a high polarization conversion efficiency (PCE) of 99.9% at 1550 nm with an IL of 0.136 dB, which is extremely low in the reported plasmonic PRs. In addition, it yields the PCE better than 96% and the IL lower than 0.42 dB over a bandwidth of 60 nm.
Keywords :
integrated optics; light polarisation; optical couplers; optical losses; optical rotation; optical waveguides; plasmonics; silicon-on-insulator; IL; PCE; asymmetrical directional coupling; coupling gap; coupling length; hybrid plasmonic polarization rotator; hybrid plasmonic waveguide; hybrid plasmonic-dielectric coupler; insertion loss; low-loss polarization rotator; plasmonic PR; polarization conversion efficiency; silicon core layer; silicon-on-insulator compatibility; size 11.2 mum; strip DW; strip Si dielectric waveguide; ultrashort polarization rotator; wavelength 1550 nm; Couplings; Insertion loss; Optical waveguides; Optimized production technology; Plasmons; Silicon; Strips; Integrated optical devices; plasmonics; polarization rotators; silicon photonics;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2014.2365294