DocumentCode :
2112927
Title :
Evaluation Of Two-dimensional Transient Enhanced Diffusion Of Phosphorus During Shallow Junction Formation
Author :
Sato, Hisako ; Tsuneno, Katsumi ; Masuda, Hiroo
Author_Institution :
Hitachi,Ltd.
fYear :
1993
fDate :
14-15 May 1993
Firstpage :
86
Lastpage :
87
Keywords :
Acceleration; Analytical models; Fabrication; Furnaces; Implants; Semiconductor process modeling; Simulated annealing; Tail; Temperature dependence; Very large scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
Print_ISBN :
0-7803-1338-0
Type :
conf
DOI :
10.1109/VPAD.1993.724732
Filename :
724732
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2112927
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