DocumentCode :
2113460
Title :
Effects Of Nitride Viscosity On The Stress Distribution In LOCOS Structure
Author :
Kuroda, S. ; Okihara, M. ; Hirashita, N. ; Nishi, K.
Author_Institution :
OKI Electric Industry Co., Ltd.
fYear :
1993
fDate :
14-15 May 1993
Firstpage :
90
Lastpage :
91
Keywords :
Compressive stress; Elasticity; Electron devices; Equations; Oxidation; Research and development; Shape; Silicon; Very large scale integration; Viscosity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
Print_ISBN :
0-7803-1338-0
Type :
conf
DOI :
10.1109/VPAD.1993.724734
Filename :
724734
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2113460
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