DocumentCode :
2115979
Title :
The role of high-doped source and drain on device performance in nano-scale Si-MOSFETs
Author :
Sano, Nobuyuki
Author_Institution :
Inst. of Appl. Phys., Univ. of Tsukuba, Tsukuba, Japan
fYear :
2011
fDate :
19-20 May 2011
Firstpage :
22
Lastpage :
23
Abstract :
Monte Carlo simulations coupled self-consistently with the 3D Poisson equation under the Double-Gate MOSFET structures are carried out to investigate quantitatively the dynamical potential fluctuations of the Coulomb interaction. It is shown that the potential fluctuations lead to the band-tail in the space-averaged density of states and it becomes position-dependent even inside the source where quasi-equilibrium is usually presumed. This implies that electrons in the source near the channel could be under highly off-equilibrium.
Keywords :
MOSFET; Monte Carlo methods; elemental semiconductors; nanoelectronics; silicon; 3D Poisson equation; Coulomb interaction; Monte Carlo simulations; Si; double-gate MOSFET; high-doped source; nanoscale Si-MOSFET; quasiequilibrium; space-averaged state density; Electric potential; Fluctuations; Force; MOSFET circuits; Mathematical model; Monte Carlo methods; Scattering; Coulomb interaction; MOSFET; Monte Carlo method; band-tail; elctron transport; potential fluctuation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Future of Electron Devices, Kansai, (IMFEDK), 2011 International Meeting for
Conference_Location :
Osaka
Print_ISBN :
978-1-61284-145-8
Electronic_ISBN :
978-1-61284-147-2
Type :
conf
DOI :
10.1109/IMFEDK.2011.5944825
Filename :
5944825
Link To Document :
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