• DocumentCode
    2116052
  • Title

    Electron Transport Models For Unstrained And Strained Si And SiGe

  • Author

    Ershov, M. ; Ryzhii, V.

  • Author_Institution
    Russian Academy of Sciences
  • fYear
    1993
  • fDate
    14-15 May 1993
  • Firstpage
    110
  • Lastpage
    111
  • Keywords
    Electron mobility; Germanium alloys; Germanium silicon alloys; Impact ionization; Kinetic theory; MOSFET circuits; Scattering; Silicon alloys; Silicon germanium; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Process and Device Modeling, 1993. (1993 VPAD) 1993 International Workshop on
  • Print_ISBN
    0-7803-1338-0
  • Type

    conf

  • DOI
    10.1109/VPAD.1993.724744
  • Filename
    724744