DocumentCode
2116098
Title
Fabrication of semiconductor nanoparticles using electro spray deposition method
Author
Doe, Takahiro ; Horita, Masahiro ; Nishida, Takashi ; Ishikawa, Yasuaki ; Uraoka, Yukiharu
Author_Institution
Nara Inst. of Sci. & Technol., Ikoma, Japan
fYear
2011
fDate
19-20 May 2011
Firstpage
32
Lastpage
33
Abstract
ZnS semiconductor nanoparticles were fabricated using electro spray process. We chose the electro spray deposition (ESD) method which is one of a particle preparation process from spray pyrolysis route. The ESD method, which produces nano-size droplets, combined with the evaporation of solvent of nano droplets can fabricate nanoparticle whose size are controlled to single nano order size and behave a quantum confinement effect. We successfully obtained 3.7 nm as the average size and 2.3 nm as the FWHM by precise controlled for the nozzle tip size and the applied voltage to 25 μm and 2.3 kV, respectively.
Keywords
II-VI semiconductors; electrodeposition; materials preparation; nanofabrication; nanoparticles; pyrolysis; semiconductor growth; wide band gap semiconductors; zinc compounds; ESD method; FWHM; ZnS; electrospray deposition method; nanosize droplets; nozzle tip size; particle preparation process; quantum confinement effect; semiconductor nanoparticle fabrication; size 2.3 nm; size 25 mum; size 3.7 nm; spray pyrolysis route; voltage 2.3 V; Electrostatic discharge; Materials; Nanoparticles; Potential well; Printing; Spraying; Voltage control; Electro spray; Printing process; Semiconductor nanoparticles; ZnS;
fLanguage
English
Publisher
ieee
Conference_Titel
Future of Electron Devices, Kansai, (IMFEDK), 2011 International Meeting for
Conference_Location
Osaka
Print_ISBN
978-1-61284-145-8
Electronic_ISBN
978-1-61284-147-2
Type
conf
DOI
10.1109/IMFEDK.2011.5944830
Filename
5944830
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