Title :
Effect of higher conduction band on electron mobility in 4H-SiC inversion layers
Author :
Watanabe, Ryuta ; Kamakura, Yoshinari ; Taniguchi, Kenji
Author_Institution :
Div. of Electr., Electron. & Inf. Eng., Osaka Univ., Suita, Japan
Abstract :
Effects of the band structure parameters on the subband energies and the electron mobility in 4H-SiC inversion layers are studied theoretically. The bulk band structure of 4H-SiC is calculated using a first-principles pseudopotential method, and then electron effective masses in the two lowest conduction bands are obtained, which are used in the self-consistent calculation of the electronic states at the SiC/SiO2 interface. It is shown that the higher-energy valley affects the mobility particularly under strong confinement condition, depending on the surface orientations.
Keywords :
MOSFET; electron mobility; silicon compounds; wide band gap semiconductors; 4H-SiC inversion layer; MOSFET; SiC-SiO2; band structure parameter; electron effective masses; electron mobility; electronic state; first-principles pseudopotential method; higher conduction band; self-consistent calculation; subband energy; surface orientation; Density functional theory; Effective mass; Electron mobility; Materials; Power MOSFET; Silicon carbide; 4H-SiC; MOSFET; calculation; effective mass; mobility; subband;
Conference_Titel :
Future of Electron Devices, Kansai, (IMFEDK), 2011 International Meeting for
Conference_Location :
Osaka
Print_ISBN :
978-1-61284-145-8
Electronic_ISBN :
978-1-61284-147-2
DOI :
10.1109/IMFEDK.2011.5944853