DocumentCode :
2116833
Title :
Irradiation effect of 8 MeV protons on single-crystalline zinc oxide
Author :
Aoki, Takahiro ; Fujimoto, Ryugo ; Koike, Kazuto ; Sasa, Shigehiko ; Yano, Mitsuaki ; Gonda, Shun-ichi ; Ishigami, Ryoya ; Kume, Kyo
Author_Institution :
Nanomater. Microdevices Res. Center, Osaka Inst. of Technol., Osaka, Japan
fYear :
2011
fDate :
19-20 May 2011
Firstpage :
88
Lastpage :
89
Abstract :
Zinc oxide (ZnO) is a potential semiconductor to exhibit high radiation hardness since large threshold displacement energy for damage can be expected due to the small unit-cell volume and large bandgap energy. To study the radiation hardness, single-crystals of a ZnO thin film, a ZnO bulk, and a GaN bulk for reference were irradiated by 8 MeV protons at a wide range of the fluence from 2×1013 to 1×1017 p/cm2. For the ZnO thin film, a rapid decrease of luminescence intensity followed by an increase of electrical resistance was observed at larger fluences than ~5×1014 p/cm2. This threshold fluence was found to be much larger and larger than those of GaN and ZnO bulk crystals, respectively, indicating that ZnO is harder than GaN, and thin film is harder than the bulk material.
Keywords :
II-VI semiconductors; energy gap; gallium compounds; luminescence; semiconductor thin films; wide band gap semiconductors; zinc compounds; GaN; GaN bulk; ZnO; ZnO bulk; ZnO thin film; band gap energy; electrical resistance; irradiation effect; luminescence intensity; protons; radiation hardness; single-crystalline zinc oxide; Crystals; Gallium nitride; Protons; Radiation effects; Resistance; Zinc oxide; ZnO; proton beam; radiation hardness;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Future of Electron Devices, Kansai, (IMFEDK), 2011 International Meeting for
Conference_Location :
Osaka
Print_ISBN :
978-1-61284-145-8
Electronic_ISBN :
978-1-61284-147-2
Type :
conf
DOI :
10.1109/IMFEDK.2011.5944858
Filename :
5944858
Link To Document :
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