Title :
Numerical simulation of applying RF energy to optically pumped Plasma
Author :
Lou, Guofeng ; Adamovich, Igor V.
Author_Institution :
Dept. of Mech. Eng., Univ. of Sci. & Technol. of Beijing, Beijing, China
Abstract :
This paper numerically investigates the vibrational distribution function, temperature and electron number density of the non-equilibrium plasma. The non-equilibrium plasma is created through an associative ionization in collisions of two highly vibrationally excited molecules, which are optically pumped by a continuous wave CO laser. A sub-breakdown RF field is applied to the plasma. The collisions between the free electrons heated by the field and the diatomic species create additional vibrational excitation in the plasma region, and the rf energy is coupled to the plasma. The results show the non-equilibrium plasma can be produced and sustained by a combination of a continuous wave CO laser and a subbreakdown radio frequency electric field by the associative ionization mechanism.
Keywords :
associative ionisation; electron impact ionisation; numerical analysis; optical pumping; plasma density; plasma heating by laser; plasma production; plasma production by laser; plasma radiofrequency heating; plasma simulation; plasma temperature; plasma-beam interactions; vibrational modes; RF energy coupling; associative ionization; continuous wave CO laser; diatomic species; electron number density; free electron collisions; highly vibrationally excited molecule collisions; optically pumped nonequilibrium plasma production; plasma temperature; subbreakdown RF field heating; subbreakdown radio frequency electric field; vibrational distribution function; vibrational excitation; Electron optics; Ionization; Laser excitation; Numerical simulation; Optical pumping; Plasma density; Plasma simulation; Plasma temperature; Plasma waves; Radio frequency;
Conference_Titel :
Power and Energy Engineering Conference (APPEEC), 2010 Asia-Pacific
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-4812-8
Electronic_ISBN :
978-1-4244-4813-5
DOI :
10.1109/APPEEC.2010.5449441