Title :
Electrical Properties of Si-Doped AlSb Polycrystalline Films by Co-Sputtering
Author :
He, Jianxiong ; Wu, Lili ; Huang, Zheng ; Hao, Xia ; Feng, Lianghuan ; Zheng, Jiagui ; Zhang, Jingquan ; Li, Wei ; Li, Bing
Author_Institution :
Coll. of Mater. Sci. .& Eng., Sichuan Univ., Chengdu, China
Abstract :
Si-doped AlSb polycrystalline films were grown on silex by magnetron co-sputtering. The conducting type, Hall mobility and carrier concentration of the films were determined. The films appear to be p-type indicating Si is shown to be predominantly an acceptor in AlSb, and holes as dominant charge carriers. Scanning electronic microscope (SEM) shows that prepared film is uniform and compact. The conductivity activation energy calculation result reveals the Si acceptor level is very close to the top of the valence band.
Keywords :
Hall mobility; III-V semiconductors; aluminium compounds; carrier density; electrical conductivity; impurity states; semiconductor doping; semiconductor thin films; silicon; sputter deposition; valence bands; AlSb:Si; Hall mobility; SEM; carrier concentration; charge carriers; conducting type; electrical property; magnetron co-sputtering; scanning electron microscopy; silicon-doped polycrystalline films; valence band; Aluminum; Atomic measurements; Conductive films; Conductivity; Hall effect; Optical films; Plasma measurements; Scanning electron microscopy; Semiconductor films; Substrates;
Conference_Titel :
Power and Energy Engineering Conference (APPEEC), 2010 Asia-Pacific
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-4812-8
Electronic_ISBN :
978-1-4244-4813-5
DOI :
10.1109/APPEEC.2010.5449463