Applied Materials´ Product Portfolio and Roadmap

Author

Hunter, Aaron ; Zelenko, Jeremy ; Mani, Rajesh

Author_Institution

Appl. Mater., Sunnyvale

fYear

2007

fDate

2-5 Oct. 2007

Firstpage

13

Lastpage

17

Abstract

Applied materials played a pivotal role in the commercial acceptance of rapid thermal processing (RTP) within the semiconductor industry, largely by solving the problem of precisely measuring and controlling the temperature of silicon. Today, our RTP-based products are used for processes as varied as radical oxidation, gate oxide engineering, metal silicide annealing, and ultra shallow junction annealing spanning the temperature range from 240degC to over 1200degC. The next generation RTP - millisecond annealing - is following the same trends by providing the most production worthy yet technically capable tool in the world.

Keywords

annealing; elemental semiconductors; oxidation; rapid thermal annealing; semiconductor device manufacture; silicon; applied materials; gate oxide engineering; metal silicide annealing; millisecond annealing; oxidation; rapid thermal processing; semiconductor industry; ultrashallow junction annealing; Electronics industry; Oxidation; Portfolios; Rapid thermal annealing; Rapid thermal processing; Semiconductor materials; Silicides; Silicon; Temperature control; Temperature distribution;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Thermal Processing of Semiconductors, 2007. RTP 2007. 15th International Conference on

Conference_Location

Catania, Sicily

Print_ISBN

978-1-4244-1228-0

Electronic_ISBN

978-1-4244-1228-0

Type

conf

DOI

10.1109/RTP.2007.4383813

Filename

4383813