• DocumentCode
    2121864
  • Title

    Two-dimensional device simulation of polysilicon thin film transistors

  • Author

    Deng, Wanling ; Huang, Junkai ; Chen, Sunwen

  • Author_Institution
    Dept. of Electron. Eng., Jinan Univ., Guangzhou, China
  • fYear
    2012
  • fDate
    21-23 April 2012
  • Firstpage
    3679
  • Lastpage
    3682
  • Abstract
    Electrical characteristics of polysilicon thin-film transistors (poly-Si TFTs) are strongly affected by density of trap states in the energy bandgap. Based on the single exponential deep state density, two-dimensional simulation is used to construct an n-channel poly-Si TFT and simulate its DC and AC characteristics. Subthreshold swing, threshold voltage and gate capacitances are included. Compact models are derived that can describe the unique behaviors of the aforementioned parameters based on the observation of simulation results.
  • Keywords
    elemental semiconductors; silicon; thin film transistors; AC characteristics; DC characteristics; Si; density of trap state; electrical characteristics; energy bandgap; gate capacitance; n-channel poly-Si TFT; polysilicon thin film transistor; single exponential deep state density; subthreshold swing; two-dimensional device simulation; Capacitance; Films; Integrated circuit modeling; Logic gates; Simulation; Thin film transistors; Threshold voltage; gate capacitance; polysilicon thin-film transistors; subthreshold swing; threshold voltage; two-dimensional simulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Consumer Electronics, Communications and Networks (CECNet), 2012 2nd International Conference on
  • Conference_Location
    Yichang
  • Print_ISBN
    978-1-4577-1414-6
  • Type

    conf

  • DOI
    10.1109/CECNet.2012.6201804
  • Filename
    6201804