DocumentCode
2122100
Title
Multifunctional PECVD layers: Dopant source, passivation, and optics
Author
Seiffe, Johannes ; Pillath, Florian ; Trogus, Daniel ; Brand, Andreas Arnold ; Savio, Christian ; Hofmann, Marc ; Rentsch, Jochen
Author_Institution
Fraunhofer Institute for Solar Energy Systems, Freiburg D-79110, Germany
fYear
2012
fDate
3-8 June 2012
Firstpage
1
Lastpage
6
Abstract
In this study, the feasibility of creating one dielectric layer system acting simultaneously as antireflection coating, phosphorous doping source, masking against metal plating, and surface passivation is presented. Moreover, a similar layer stack is described, which behaves as rear-side surface passivation, boron dopant source, and internal reflection mirror. The optical characteristics of these layers are especially investigated and optimized for a solar cell´s front- and rear-side coating. By consequent use of the multifunctional layers, a totally diffused solar cell with rear-side passivation and local rear contacts can be produced using only one wet chemical bath sequence, one multilayer vacuum step, and one high-temperature process. We present the first proof of concept for such a solar cell production using multifunctional plasma-enhanced chemical vapor deposition layers resulting already in a conversion efficiency of 18.3%.
Keywords
Coatings; Doping; Passivation; Photovoltaic cells; Silicon; Standards; Antireflection coating (ARC); doping; plasma-enhanced chemical vapor deposition (PECVD); solar cells; surface passivation;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), Volume 2, 2012 IEEE 38th
Conference_Location
Austin, TX, USA
Type
conf
DOI
10.1109/PVSC-Vol2.2012.6656780
Filename
6656780
Link To Document