Patterning photosensitive layers for optoelectronic applications

The technology of light-sensitive amorphous chalcogenide layers, made from As-Ge-Se raw glasses, thick layers of acrylic polymers, made from mixture of isomers as well as two types of nanocomposites of these materials with gold nanoparticles was developed. These layers were used for direct, one-step surface geometrical and optical (amplitude-phase) relief recording by laser- or electron-beams. Investigations were directed to the establishment of giant geometrical relief formation processes, which resulted elements like bumps, single lines and diffractive gratings applicable as elements of integrated optics. The mechanism of the recording processes, which include excitation of electron-hole processes, structural transformation or polymerization, as well as mass-transport component was accepted for explanation of comparable effects at light- and electron beam recording. Selection of the materials and recording conditions with best resulting parameters was done.