Design of GDSII pattern conversion system

The maskless lithography technology based on Digital micromirror Device is a new way to achieve the goal of large-scale, rapid, flexible lithography. In order to meet the needs of maskless lithography system, Reading and digitization of GDSII file was studied in this paper, the system of pattern conversion was developed, so as to the layout of GDSII can be converted to a digital lithography pattern on DMD. The core layer and interactive layer of system were designed based on the UML method in J2EE. The core layer realized the reading and display of GDSII file. Interactor offeres friendly user interface for core layer.