Title :
MBE growth conditions for 1.3 μm light emission from InAs quantum dots
Author :
Lipinski, M.O. ; Jin-Phillipp, N.Y. ; Schmidt, O.G. ; Eberl, K.
Author_Institution :
Max-Planck-Inst. fur Festkorperforschung, Stuttgart, Germany
Abstract :
InAs/GaAs quantum dots grown by molecular beam epitaxy (MBE) at extremely low growth rates of only 0.01 monolayers per second and a growth temperature of 500°C result in low density and large free standing islands. We show that shape and photoluminescence (PL) spectra change drastically if the capping temperature is reduced from 500°C to 400°C. At high capping temperatures flat 3 nm high lens shaped islands are identified in transmission electron microscopy (TEM) whereas at lower capping temperatures islands stay 6 nm in height and the emission wavelength shifts from 1113 nm to 1200 nm. The later corresponds to 1.294 μm at room temperature. Based on our investigation an Al-free light emitting diode (LED) is fabricated
Keywords :
III-V semiconductors; gallium arsenide; indium compounds; molecular beam epitaxial growth; photoluminescence; semiconductor growth; semiconductor quantum dots; transmission electron microscopy; 1.3 μm light emission; 1113 to 1200 nm; 400 C; 500 C; 6 nm; Al-free light emitting diode; InAs quantum dots; InAs-GaAs; InAs/GaAs quantum dots; MBE growth conditions; emission wavelength shifts; lens shaped islands; lower capping temperatures; molecular beam epitaxy; photoluminescence; Electron emission; Gallium arsenide; Lenses; Light emitting diodes; Molecular beam epitaxial growth; Photoluminescence; Quantum dots; Shape; Temperature; Transmission electron microscopy;
Conference_Titel :
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location :
Williamsburg, VA
Print_ISBN :
0-7803-6320-5
DOI :
10.1109/ICIPRM.2000.850270