DocumentCode :
2124025
Title :
Surface potential redistribution in laterally diffused field effect transistors
Author :
Hsueh-Chun Liao ; Yeh-Wei Wu ; Ruey-Dar Chang ; Jung-Ruey Tsai
Author_Institution :
Asia Univ., Taichung, Taiwan
fYear :
2013
fDate :
25-26 Feb. 2013
Firstpage :
62
Lastpage :
64
Abstract :
Device simulation was performed to investigate the redistribution of surface potential in high-voltage lateral diffused metal-oxide-semiconductor field effect transistors. When the high electric field in the extended drift region causes quasi-saturation effect, the surface potential near the drift region is reduced with the increase of the inversion carries. A model was proposed to describe the potential redistribution based on the reduction of the depletion region in the junction between the channel and drift region.
Keywords :
MOSFET; semiconductor device models; surface potential; depletion region; device simulation; extended drift region; high electric field; high-voltage lateral diffused metal-oxide-semiconductor field effect transistors; laterally diffused field effect transistors; quasisaturation effect; surface potential redistribution; Electric fields; Electric potential; Field effect transistors; IEEE transactions; Junctions; Logic gates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Next-Generation Electronics (ISNE), 2013 IEEE International Symposium on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-4673-3036-7
Type :
conf
DOI :
10.1109/ISNE.2013.6512287
Filename :
6512287
Link To Document :
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