DocumentCode :
2124504
Title :
Effect of substrate type and thickness on power output of silicon nanowire thermoelectric device
Author :
Hsin-Luen Tsai
Author_Institution :
Dept. of Electron. Eng., Kao Yuan Univ., Kaohsiung, Taiwan
fYear :
2013
fDate :
25-26 Feb. 2013
Firstpage :
126
Lastpage :
129
Abstract :
The effects of substrate type and thickness on the performance of silicon nanowire thermoelectric device were investigated. It is found that the increase in the etching time results in the longer nanowires and larger power output. The substrate type has no significant effect on the power generation. Under the same recipes, the I-V characteristics and power outputs were examined for two different thicknesses of N-type substrate. For the thin substrate, the better performance can be attributed to low thickness ratio of silicon bulks to silicon nanwire array and series resistance. In brief, the substrate thickness, silicon nanowire length and nanowire number density are major elements for optimized thermoelectric power generation.
Keywords :
elemental semiconductors; etching; nanowires; silicon; thermoelectric conversion; thermoelectric devices; I-V characteristics; N-type substrate thickness; Si; etching time; nanowire number density; optimized thermoelectric power generation; power generation; power output thickness; series resistance; silicon nanowire length; silicon nanowire thermoelectric device; silicon nanwire array; substrate type effect; Arrays; Etching; Nanoscale devices; Silicon; Substrates; Temperature measurement; Thermoelectric devices; electroless etching method; silicon nanowires (SiNWs); thermoelectric device (TED);
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Next-Generation Electronics (ISNE), 2013 IEEE International Symposium on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-4673-3036-7
Type :
conf
DOI :
10.1109/ISNE.2013.6512306
Filename :
6512306
Link To Document :
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