Title :
Monolithic PIN-HEMT photoreceiver integration
Author :
Rondeau, G. ; Biblemont, S. ; Decobert, J. ; Post, G.
Author_Institution :
OPTO+, France Telecom, Marcoussis, France
Abstract :
In current telecommunications systems, there is a strong need to increase the data rate. The next generation of optical communication systems will operate at 40 Gb/s. As high-speed receivers for such systems, monolithic photoreceiver OEICs are very attractive, because of their potential for lower parasitics and higher performances compared to hybrid approaches. We report here the monolithic integration of a InP[Zn]/GaInAs/InP[Si] PIN photodiode with GaInAs/InP composite channel HEMTs. The PIN-HEMT structure is grown by single-step LP-MOVPE on pre-recessed semi-insulating InP substrate. This quasi-planar integration scheme allows a standard microelectronics processing. The 0.1 μm T-shape HEMT gates are defined by e-beam lithography, as close as 70 μm to the 3 μm deep photodiode pockets. As a preliminary result, a 4-channel receiver OEIC has photodiodes with 0.8 A/W responsivity, 30 nA dark current at -10 V, two-stage amplifiers with 20 to 28 dB gain and a bandwidth of 3 GHz
Keywords :
III-V semiconductors; high electron mobility transistors; indium compounds; integrated optoelectronics; optical receivers; p-i-n photodiodes; GaInAs-InP; GaInAs/InP composite channel HEMT; InP:Zn-GaInAs-InP:Si; InP:Zn/GaInAs/InP:Si PIN photodiode; LP-MOVPE growth; electron beam lithography; high-speed photoreceiver OEIC; monolithic integration; optical communication system; semi-insulating InP substrate; HEMTs; Indium phosphide; Lithography; MODFETs; Microelectronics; Monolithic integrated circuits; Optical fiber communication; Optical receivers; Optoelectronic devices; PIN photodiodes;
Conference_Titel :
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location :
Williamsburg, VA
Print_ISBN :
0-7803-6320-5
DOI :
10.1109/ICIPRM.2000.850300