DocumentCode
2125463
Title
Aluminum nitride films for optical applications
Author
Dumitru, V. ; Cimpoiasu, Elena ; Morosanu, C. ; Nenu, Cristina ; Necsoiu, Dana
Author_Institution
Politehnic Univ. of Bucharest, Romania
Volume
2
fYear
1996
fDate
9-12 Oct 1996
Firstpage
641
Abstract
Hard and adherent AlN layers on glass have been deposited by reactive magnetron sputtering. The deposition rate, the structure and the optical properties have been investigated mainly with respect to possible optical applications
Keywords
III-V semiconductors; X-ray diffraction; absorption coefficients; aluminium compounds; crystal structure; gradient index optics; optical films; refractive index; semiconductor growth; semiconductor thin films; sputter deposition; AlN; AlN films; absorption coefficient; adherent layers; deposition rate; graded index multilayers; hard layers; optical applications; reactive magnetron sputtering; refractive index; structure; Aluminum nitride; Fluid flow; Nitrogen; Optical films; Radio frequency; Sputtering; Thickness measurement; X-ray diffraction;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference, 1996., International
Conference_Location
Sinaia
Print_ISBN
0-7803-3223-7
Type
conf
DOI
10.1109/SMICND.1996.557473
Filename
557473
Link To Document