DocumentCode :
2125850
Title :
GaInNAs/GaAs multiple quantum-wells (MQWs) for 1.3 μm laser applications
Author :
Illek, S. ; Borchert, B. ; Ebbinghaus, G. ; Egorov, A.Yu. ; Riechert, H.
Author_Institution :
Corp. Res. CPR PH, Infineon Technol., Munich, Germany
fYear :
2000
fDate :
2000
Firstpage :
537
Lastpage :
540
Abstract :
Rapid progress has been made in the growth of GaInNAs/GaAs both by MOCVD using unsymmetrical dimethyl-hydrazine and by solid source MBE using an RF plasma source for the generation of atomic nitrogen. Significant improvements of material quality for 1.3 μm wavelength laser emission have been achieved with the best results realised so far by MBE growth. Based on this MBE material, ridge-waveguide lasers as well as narrow stripe oxide-confined lasers have been realised. Devices emitting close to 1.3 μm show threshold currents as low as 11 mA, slope efficiencies of 0.39 W/A and CW operation at 100°C. The performance data of these lasers demonstrate that this new material can successfully compete with the well matured InGaAsP/InP material system
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; quantum well lasers; ridge waveguides; waveguide lasers; 1.3 μm laser applications; 1.3 mum; 100 C; GaInNAs-GaAs; GaInNAs/GaAs multiple quantum-wells; MBE growth; ridge-waveguide lasers; Atomic beams; Gallium arsenide; MOCVD; Nitrogen; Optical materials; Plasma sources; Quantum well devices; Quantum well lasers; Radio frequency; Solids;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2000. Conference Proceedings. 2000 International Conference on
Conference_Location :
Williamsburg, VA
ISSN :
1092-8669
Print_ISBN :
0-7803-6320-5
Type :
conf
DOI :
10.1109/ICIPRM.2000.850353
Filename :
850353
Link To Document :
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