Title :
A new scanning X-ray interferometer [for basic physical constants determination]
Author :
Bergamin, A. ; Cavagnero, G. ; Mana, G. ; Massa, E. ; Zosi, G. ; Leistner, A. ; Pavlovic, E.
Author_Institution :
Ist. di Metrol., CNR, Torino, Italy
Abstract :
The need has arisen for a reduction of the present uncertainty of 3/spl times/10/sup -8/ in the measurement of the (220) lattice spacing, d/sub 220/, of silicon monocrystals. This article describes our step-by-step approach towards this goal.
Keywords :
Constants; Electromagnetic wave interferometers; Electromagnetic wave interferometry; Lattice constants; Polishing; Silicon; Sputter etching; X-ray apparatus; X-ray topography; Si; alignment; basic physical constants determination; ion etching; lattice spacing measurement; monocrystals; nanopositioning; on-line lattice healing; phase-contrast X-ray topography; polishing; scanning X-ray interferometer; translation system; uncertainty reduction; Etching; Laboratories; Lattices; Manufacturing; Measurement uncertainty; Optical distortion; Optical interferometry; Phase shifting interferometry; Shape; Silicon;
Conference_Titel :
Precision Electromagnetic Measurements Digest, 2000 Conference on
Conference_Location :
Sydney, NSW, Australia
Print_ISBN :
0-7803-5744-2
DOI :
10.1109/CPEM.2000.850901
