DocumentCode
2128172
Title
Linear versus saturated drive current: tradeoffs in super steep retrograde well engineering
Author
Thompson, S.E. ; Packan, P.A. ; Bohr, M.T.
Author_Institution
Portland Technol. Dev. & TCAD, Intel Corp., Hillsboro, OR, USA
fYear
1996
fDate
11-13 June 1996
Firstpage
154
Lastpage
155
Abstract
Compared to uniform well doping profiles the use of super steep retrograde well (SSRW) doping can significantly improve short channel effects permitting operation at smaller device sizes. However, the use of a SSRW does not significantly increase saturated drive current for these devices due to reduced drain saturation voltages (V/sub DSAT/). The reduction in V/sub DSAT/ occurs because the SSRW increases the depletion bulk charge and threshold voltage near the drain at high drain biases (body effect). It is shown for the first time that unlike the saturated drive current, the linear drive current exhibits a large increase for minimum size devices resulting in significantly improved inverter switching times. Improvements in gate delay of more than 10% are reported for SSRW devices.
Keywords
MOSFET; doping profiles; semiconductor doping; MOSFET; body effect; depletion bulk charge; doping profile; drain saturation voltage; gate delay; inverter switching time; linear drive current; saturated drive current; short channel effect; super steep retrograde well engineering; threshold voltage; Delay; Doping profiles; Inverters; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
Conference_Location
Honolulu, HI, USA
Print_ISBN
0-7803-3342-X
Type
conf
DOI
10.1109/VLSIT.1996.507830
Filename
507830
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