• DocumentCode
    2128172
  • Title

    Linear versus saturated drive current: tradeoffs in super steep retrograde well engineering

  • Author

    Thompson, S.E. ; Packan, P.A. ; Bohr, M.T.

  • Author_Institution
    Portland Technol. Dev. & TCAD, Intel Corp., Hillsboro, OR, USA
  • fYear
    1996
  • fDate
    11-13 June 1996
  • Firstpage
    154
  • Lastpage
    155
  • Abstract
    Compared to uniform well doping profiles the use of super steep retrograde well (SSRW) doping can significantly improve short channel effects permitting operation at smaller device sizes. However, the use of a SSRW does not significantly increase saturated drive current for these devices due to reduced drain saturation voltages (V/sub DSAT/). The reduction in V/sub DSAT/ occurs because the SSRW increases the depletion bulk charge and threshold voltage near the drain at high drain biases (body effect). It is shown for the first time that unlike the saturated drive current, the linear drive current exhibits a large increase for minimum size devices resulting in significantly improved inverter switching times. Improvements in gate delay of more than 10% are reported for SSRW devices.
  • Keywords
    MOSFET; doping profiles; semiconductor doping; MOSFET; body effect; depletion bulk charge; doping profile; drain saturation voltage; gate delay; inverter switching time; linear drive current; saturated drive current; short channel effect; super steep retrograde well engineering; threshold voltage; Delay; Doping profiles; Inverters; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-3342-X
  • Type

    conf

  • DOI
    10.1109/VLSIT.1996.507830
  • Filename
    507830