DocumentCode :
2128172
Title :
Linear versus saturated drive current: tradeoffs in super steep retrograde well engineering
Author :
Thompson, S.E. ; Packan, P.A. ; Bohr, M.T.
Author_Institution :
Portland Technol. Dev. & TCAD, Intel Corp., Hillsboro, OR, USA
fYear :
1996
fDate :
11-13 June 1996
Firstpage :
154
Lastpage :
155
Abstract :
Compared to uniform well doping profiles the use of super steep retrograde well (SSRW) doping can significantly improve short channel effects permitting operation at smaller device sizes. However, the use of a SSRW does not significantly increase saturated drive current for these devices due to reduced drain saturation voltages (V/sub DSAT/). The reduction in V/sub DSAT/ occurs because the SSRW increases the depletion bulk charge and threshold voltage near the drain at high drain biases (body effect). It is shown for the first time that unlike the saturated drive current, the linear drive current exhibits a large increase for minimum size devices resulting in significantly improved inverter switching times. Improvements in gate delay of more than 10% are reported for SSRW devices.
Keywords :
MOSFET; doping profiles; semiconductor doping; MOSFET; body effect; depletion bulk charge; doping profile; drain saturation voltage; gate delay; inverter switching time; linear drive current; saturated drive current; short channel effect; super steep retrograde well engineering; threshold voltage; Delay; Doping profiles; Inverters; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
Conference_Location :
Honolulu, HI, USA
Print_ISBN :
0-7803-3342-X
Type :
conf
DOI :
10.1109/VLSIT.1996.507830
Filename :
507830
Link To Document :
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