DocumentCode :
2128644
Title :
The effect of intrinsic capacitance degradation on circuit performance
Author :
Changhong Dai ; Walstra, S.V. ; Shiuh-Wuu Lee
Author_Institution :
Technol. CAD Dept., Intel Corp., Santa Clara, CA, USA
fYear :
1996
fDate :
11-13 June 1996
Firstpage :
196
Lastpage :
197
Abstract :
The effects of intrinsic capacitance degradation in deep submicron CMOS technology are investigated. This investigation shows that: the measured C/sub gd/ decreases while C/sub gs/ increases during the accelerated hot-carrier stress with V/sub ds//spl Gt/V/sub gs/>V/sub th/; the simulated degraded circuit performance is improved by inclusion of C/sub gd/ degradation over just including I/sub dsat/ degradation; the inclusion of intrinsic capacitance degradation into performance analysis may be critical to the derivation of realistic hot-carrier reliability evaluation.
Keywords :
CMOS integrated circuits; capacitance; circuit analysis computing; hot carriers; integrated circuit modelling; integrated circuit reliability; integrated circuit testing; 31 stage ring oscillator circuit; accelerated hot-carrier stress; circuit performance; deep submicron CMOS technology; hot-carrier reliability evaluation; intrinsic capacitance degradation; performance analysis; Acceleration; Analytical models; CMOS technology; Capacitance measurement; Circuit optimization; Circuit simulation; Degradation; Hot carriers; Performance analysis; Stress measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1996. Digest of Technical Papers. 1996 Symposium on
Conference_Location :
Honolulu, HI, USA
Print_ISBN :
0-7803-3342-X
Type :
conf
DOI :
10.1109/VLSIT.1996.507850
Filename :
507850
Link To Document :
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