DocumentCode :
2130427
Title :
Micromachined silicon radiation sensors - Part 2: Fabrication technologies
Author :
Bagolini, A. ; Boscardin, M. ; Conci, P. ; Crivellari, M. ; Giacomini, G. ; Mattedi, F. ; Piemonte, C. ; Ronchin, S. ; Zorzi, N. ; Benkechkache, M.A. ; Dalla Betta, G.-F. ; Mendicino, R. ; Pancheri, L. ; Povoli, M. ; Sultan, D.M.S.
Author_Institution :
Center for Mater. & Microsyst., FBK (Kessler Found. for Res.), Trento, Italy
fYear :
2015
fDate :
3-5 Feb. 2015
Firstpage :
1
Lastpage :
4
Abstract :
The aim of this work is to present the main technological developments carried out at FBK for micro machined radiation sensors used in High Energy Physics (HEP) experiments. We report on the main technological issues to integrate silicon etching (wet and dry) techniques in the fabrication flow for silicon detector and we show some examples of innovative detectors realized by means of these technologies.
Keywords :
elemental semiconductors; micromachining; micromechanical devices; nuclear electronics; passivation; silicon; silicon radiation detectors; sputter etching; FBK; HEP; Si; fabrication flow; fabrication technologies; high energy physics; micromachined silicon radiation sensors; silicon detector; silicon etching techniques; Detectors; Etching; Image edge detection; Neutrons; Silicon; Three-dimensional displays; DRIE; High Energy Physics; Micromachining; silicon detectors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
AISEM Annual Conference, 2015 XVIII
Conference_Location :
Trento
Type :
conf
DOI :
10.1109/AISEM.2015.7066822
Filename :
7066822
Link To Document :
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